Neil Hsu

In recent years, the requirements of optoelectric product are inceasing gradually, like the electrode of solar battery, the liquid crystal display (LCD) and touch panel. Among them, the transparent conductive thin film plays an important role.

 

Now, magnetic rf sputtering is the most common technique to produce GZO thin film, but its cost is very high because of vacuum chamber.

 

Therefore, we use Atmosphere Pressure Plasma Jet to produce the GZO thin films. It has lower cost and easier to maintain